1310 nm DFB LASER DIODE MODULES UNCOOLED MQW DFB LD WITH RECEPTACLE

文件：133.65 Kbytes Page：2 Pages

1310 nm DFB LASER DIODE MODULES UNCOOLED MQW DFB LD WITH RECEPTACLE

文件：133.65 Kbytes Page：2 Pages

1310 nm DFB LASER DIODE MODULES UNCOOLED MQW DFB LD WITH RECEPTACLE

文件：133.65 Kbytes Page：2 Pages

1310 nm DFB LASER DIODE MODULES UNCOOLED MQW DFB LD WITH RECEPTACLE

文件：133.65 Kbytes Page：2 Pages

HIGH CURRENT SILICON BRIDGE RECTIFIERS(VOLTAGE - 50 to 800 Volts CURRENT - 10 to 35 Amperes)

VOLTAGE - 50 to 800 Volts CURRENT - 10 to 35 Amperes FEATURES ● Electrically Isolated Metal Case for Maximum Heat Dissipation ● Surge Overload Ratings to 400 Amperes ● These bridges are on the U/L Recognized Products List for currents of 10, 25 and 35 amperes MECHANICAL DATA

HIGH CURRENT SILICON BRIDGE RECTIFIERS(VOLTAGE - 50 to 800 Volts CURRENT - 15 to 35 Amperes)

VOLTAGE - 50 to 800 Volts CURRENT - 15 to 35 Amperes FEATURES • Plastic Case With Heatsink For Heat Dissipation • Surge Overload Ratings to 400 Amperes • The plastic package has Underwriters Laboratory Flammability Classification 94V-O

Lamps for Photolithography

Description PerkinElmer Optoelectronics is a leading manufacturer of mercury short arc lamps ranging in output power from 1000 to 8000 watts. These lamps are used in the production of printed circuit boards, liquid crystal displays and semiconductors. The HSH Series lamps are used worldwide in mi

Lamps for Photolithography

Description PerkinElmer Optoelectronics is a leading manufacturer of mercury short arc lamps ranging in output power from 1000 to 8000 watts. These lamps are used in the production of printed circuit boards, liquid crystal displays and semiconductors. The HSH Series lamps are used worldwide in mi

Low-Cost Digital Linescan Camera

Description In the LD3500-series digital linescan camera, PerkinElmer has combined the best features of photodiode array detection, high-speed charge-coupled scanning, and digital line scan camera technology to offer an uncompromising solution to the increasing demands of advanced imaging applica