Features and Benefits

• Designed to provide superior cleaning without

damaging advanced films or new materials

• Excellent removal of particles and metal

contamination in one-step clean

• Increased performance through enhanced

reliability and yield

• Low to zero corrosion and defects on W surface

• Low to zero defect on major surfaces including

W and SiN

• Compatible with major consumables

• Meets EHS requirements for fab chemistries

• Low cost of ownership with low chemistry

consumption

• Shelf life of one year

Applications

• W post-CMP process