FEATURES & BENEFITS

308 nm wavelength for high yield

OLED and LCD polysilicon annealing

Superior pulse stability and high

depth of field to ensure a large

process window

Short and long axis beam homogeneity

for maximum throughput and beam

utilization

Proven performance in leading

large-scale OLED and LCD fabs

Active control and observation

modules for reproducible annealing

results

Line beam lengths scalable up

to Gen 10.5 panel size

APPLICATIONS

Excimer Laser Annealing (ELA)

of polysilicon backplanes for

OLED and LCD